发明名称 |
Forming thin coating for manufacturing semiconducting components involves applying coating to material resistant to melting temperature or cover of material to coating before melting |
摘要 |
The method involves applying a material to a bearer to form a coating, e.g. by deposition, melting the coating and cooling to crystallize it. The coating is applied to a material resistant to the melting temperature or a cover of the material is applied to the coating before melting. The material is chemically inert relative to the coating material and/or an oxide layer is formed between the coating and cover at least during crystallization.
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申请公布号 |
DE10005484(A1) |
申请公布日期 |
2001.08.16 |
申请号 |
DE2000105484 |
申请日期 |
2000.02.08 |
申请人 |
ANGEWANDTE SOLARENERGIE - ASE GMBH |
发明人 |
BUSS, WERNER |
分类号 |
H01L21/20;(IPC1-7):H01L21/20;H01L31/18;H01L21/324;H01L31/039;H01L31/036 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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