| 摘要 |
PROBLEM TO BE SOLVED: To analyze trace metal elements contained in ultrapure water used for washing of a semiconductor substrate, in a short time while a large number of elements are analyzed at the same time. SOLUTION: Analysis for a solution is carried out using an inductively coupled plasma mass spectrograph in an evaluating method for evaluating water quality comprising a process for bringing the substrate into contact with evaluated water, a process for dissolving thereafter a surface of the substrate with the solution, and a process for recovering the solution to conduct analysis.
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