| 摘要 |
PROBLEM TO BE SOLVED: To provide a separation mechanism having a means for facilitating the separation of a work and a mask after the end of exposure processing in an exposure device. SOLUTION: A gas supplying means which is used for an exposure device 1 arranged with the work 3 and the mask 5 on a loading stage 2 and used to expose prescribed patterns thereto and has gas blow ports 21 for blowing gas to the contact boundary between the work 3 and the mask 5 in releasing the contact of the work 3 and the mask 5 is constituted as the separation mechanism for the work and the mask disposed on the loading stage 2. |
