发明名称 Laser gas replenishment method
摘要 A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber. The driving voltage is determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.
申请公布号 US2001012309(A1) 申请公布日期 2001.08.09
申请号 US20000734459 申请日期 2000.12.11
申请人 ALBRECHT HANS-STEPHAN;VOGLER KLAUS WOLFGANG;SCHROEDER THOMAS 发明人 ALBRECHT HANS-STEPHAN;VOGLER KLAUS WOLFGANG;SCHROEDER THOMAS
分类号 G03F7/20;H01S3/036;H01S3/134;H01S3/225;(IPC1-7):H01S3/22;H01S3/223 主分类号 G03F7/20
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