| 摘要 |
PROBLEM TO BE SOLVED: To substantially remove and reduce the weak point ad the problem accompanying a system and a method for gas flow cleaning developed before used in semiconductor manufacturing process. SOLUTION: A system of an integrated gas flow cleaning component is provided with a gas cleaner operable for cleaning the gas containing plural soils, a gas filter and a gas diffuser, the gas filter and the gas diffuser are combined together to form an integrated gas diffuser filter membrane, and the integrated gas diffuser filter membrane is combined to the bottom side of the gas cleaner, and the gas cleaner can be operated for preventing the plural soils from entering into a load-lock process chamber.
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