| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate heating and transporting process apparatus for transporting a wafer while heating it and for independently performing pressure control and temperature control on a vacuum chamber, which is formed in combination with each process chamber. SOLUTION: A substrate heating section 36 having a cylindrical housing 35 including flanges 31 and 33 on the ends, a lamp holder disposed on a center line of the housing 35, and a lamp heater disposed on the lamp holder, comprises a substrate rotating mechanism for rotating a substrate holder. The substrate heating section 36 is vacuum-shielded and held at the flange 31 of the housing 35 onto a transporting plate 38, which is moved by a rotating and moving shaft 43 in a rotationally transporting direction and a horizontal direction. The shaft 43 is rotated by a rotation mechanism 60 while vacuum-shielding a common chamber, and is horizontally moved by a moving mechanism 70. |
