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发明名称
Verfahren zur nachträglichen Erzeugung niederohmiger Verbindungen in Halbleiterbauelementen durch Laserbestrahlung
摘要
申请公布号
DE19739500(C2)
申请公布日期
2001.07.26
申请号
DE19971039500
申请日期
1997.09.09
申请人
INFINEON TECHNOLOGIES AG
发明人
LAUTERBACH, CHRISTL
分类号
H01L21/768;(IPC1-7):H01L21/768;H01L21/268;H01L23/525
主分类号
H01L21/768
代理机构
代理人
主权项
地址
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