发明名称 PATTERN TRANSFER DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device capable of realizing a pattern transfer by an imprinting process at a low cost and at the same time, make available a high productivity pattern transfer device which has no longer such a shortcoming in production that temperature fluctuations ensue in the imprinting process, through solving this conventional problem. SOLUTION: An actively rotating cylindrical mold member 6 having irregularities of a pattern shape formed on the circumferential face, is installed, in a freely ascending/descending manner, on a plate 3 on which a substrate 2 is fixedly disposed. Further, a heating means is provided on the plate 3 or the mold member 6 and a mechanism for controlling a load to be pressed to the substrate 2 is mounted on the mold member 6. The pattern transfer is achieved by pressing the mold member 6 to the substrate 2 on the plate 3 while rotating the mold member 6 and moving the mold member 6 or the plate 3 in parallel.
申请公布号 JP2001198979(A) 申请公布日期 2001.07.24
申请号 JP20000009090 申请日期 2000.01.18
申请人 ISHIKAWA SEISAKUSHO LTD;MATSUMURA HIDEKI 发明人 MATSUMURA HIDEKI;KIDA KENICHIRO
分类号 B29C59/04;H01L21/027;(IPC1-7):B29C59/04 主分类号 B29C59/04
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