发明名称 |
Stepper with exposure time monitor |
摘要 |
A method for detecting a degraded light source is provided. An exposure time associated with the light source is monitored. The exposure time is compared to at least one control limit. A degraded condition is identified based on the exposure time violating the control limit. A processing tool includes a stepper and an automatic process controller. The stepper has a light source and is adapted to illuminate a wafer for an exposure time. The automatic process controller is adapted to monitor the exposure time, compare the exposure time to at least one control limit, and identify a degraded condition based on the exposure time violating the control limit.
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申请公布号 |
US6266132(B1) |
申请公布日期 |
2001.07.24 |
申请号 |
US19990401586 |
申请日期 |
1999.09.22 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
STEWART EDWARD C.;DOSS CURTIS W.;EDWARDS RICHARD D. |
分类号 |
G03F7/20;(IPC1-7):G03B27/72;G03B27/54;G03B27/74;A61N5/00;G03C5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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