发明名称 THIN FILM DEPOSITION METHOD AND SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition method by which a film is uniformly deposited, e.g. on the surface of an insulating film with tight adhesion regardless of the material of a base layer, and, even in the case of the inside of a fine recessed part, the same can securely be buried therein and to provide a system therefor. SOLUTION: This method has a stage in which a hyperfine particle-dispersed solution in which hyperfine particles in which at least one part is composed of metals are dispersed into a solvent is prepared, a stage in which the hyperfine particle-dispersed solution is sprayed from a spray nozzle toward the surface of a substrate in a vacuum atmosphere, and the solvent contained in the hyperfine particle-dispersed solution is evaporated and is collided against the surface of the substrate and a stage in which the metals composing at least one part of the hyperfine particles collided against the surface of the substrate are bonded on the surface of the substrate.
申请公布号 JP2001192855(A) 申请公布日期 2001.07.17
申请号 JP20000001009 申请日期 2000.01.06
申请人 EBARA CORP 发明人 KATO TAKAO
分类号 C23C24/00;H01L21/288;(IPC1-7):C23C24/00 主分类号 C23C24/00
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