| 摘要 |
PROBLEM TO BE SOLVED: To provide a coat application processor and a coat application processing method, whereby the film thickness of he coat film can be made uniform and the spattering of the coating liquid can be surely prevented from the start to the end, even when adopting a dynamic coat application method. SOLUTION: A coat application processing unit 22 for applying coating liquid on the surface of a substrate G has a rotation cup 42, having an opening an its upper portion and for storing therein the substrate G, a driver 40 for rotating the substrate G in the rotation cup 42, an annular cap 45 mounted on the rotating cup 42 and having an opening 46, a coating-liquid discharging nozzle 51 for discharging the coating liquid to the substrate G via the opening 46 of the annular cap 45, a small cap 53 for choking the opening 46, a carrying arm 55 for carrying the small cap 53 and mounting it on the opening 46, and sucking and sticking means 61a, 61b, 63, 64, 66 for sucking the small cap 53 and sticking it on the outer periphery of the opening 46. |
