| 摘要 |
PURPOSE: An apparatus for displaying a contamination state of a wafer is provided to precisely form a pattern on the wafer, by generating laser light toward a lower surface of the wafer fixed in a wafer holder composed of glass, and by displaying a state of the lower surface of the wafer and the quantity of contaminating particles according to the light scanning of the lower surface of the wafer. CONSTITUTION: A wafer holder is composed of glass for settling a wafer. A light source generates light if the wafer is settled in the wafer holder. The light source scans a lower surface of the wafer, and a wafer scanning unit transfers the light according to the scanned result. A reflecting unit reflects the light transferred by the wafer scanning unit. A charge-coupled-device(CCD) camera displays the state of the lower surface of the wafer by using the quantity of the reflected light. A control unit detects information regarding a contamination state of the lower surface according to the quantity of the reflected light, and displays the information regarding the contamination state.
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