METHOD FOR FORMING MULTILAYER SEMICONDUCTOR STRUCTURE, METHOD OF ALIGNING LITHOGRAPHY MASK AND SEMICONDUCTOR STRUCTURE

摘要

PURPOSE: A method for forming multilayer semiconductor structure and a method of aligning lithography mask is provided to use with a SCALPEL tool. CONSTITUTION: The method is to form a multilayer semiconductor structure for alignment with a lithography mask or for use with a SCALPEL tool. This invention is suitable for a submicron CMOS technology and useful because of the use of an electron beam source for both alignment and exposure of a lithography mask on a semiconductor wafer.