| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type resist composition having various good resist performances such as sensitivity, resolution and adhesiveness to a substrate and excellent in wettability particularly with an alkali developing solution. SOLUTION: The resist composition contains a resin based on an alkali- insoluble or slightly alkali-soluble polymer which is made alkali-soluble by the action of an acid and has a polymerized unit of a dihydroxy-1-adamantyl (meth)acrylate of formula I and a polymerized unit having an acid labile group, e.g. a polymerized unit of a 2-alkyl-2-adamantyl(meth)acrylate of formula II and an acid generating agent. In the formulae I and II, R1 and R2 are each H or methyl; and R3 is alkyl. |
