DEVICE AND METHOD FOR CLEANING SEMICONDUCTOR

摘要

PURPOSE: A device and a method for cleaning a semiconductor are provided to effectively wash wafers that are accommodated based on a standard for placing the wafers horizontally while wafer pitches are reduced. CONSTITUTION: The first wafer retention pad base(320) having a plurality of shelves(310) for retaining wafers, and the second wafer retention pad base(430) having a plurality of shelves(410) for retaining wafers are arranged. wafers(300) are transferred in the horizontal direction from the first accommodation case to the shelves(310) for retaining wafers of the first wafer retention pad base(320). The second wafer retention pad base(430) is displaced for transferring wafers(400) in the horizontal direction from the second accommodation case to the shelves(410) for retaining wafers. After that, the distance between the wafers is adjusted before washing.