SYSTEM AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technology for performing plasma processing in-line, while suppressing plasma damages. SOLUTION: At performing plasma processing using a plasma generated at a plasma generating section, a matching circuit is connected with one end of an induction coupling coil at the plasma generating section and having the other end connected to a capacitor. The capacitor serves to reduce the potential difference between a voltage-induced at one end of the coil and a voltage induced at the other end of the coil.