发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in sensitivity, adhesion, chemical resistance, flexibility and property of not contaminating a plating bath and a method for producing a printed wiring board using the composition. SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in one molecule and (C1) a coumarin derivative of formula I and (C2) a boron salt compound of formula II as (C) a photopolymerization initiator system. The photosensitive resin composition is applied on a substrate and dried and a protective film is optionally disposed to obtain the photosensitive element. The printed wiring board is produced using the photosensitive element. In the formulae I and II, Z1-Z10 are each halogen, a 1-20C alkyl or the like; (m) is an integer of 0-2; and (n) is an integer of 0-4.
申请公布号 JP2001174992(A) 申请公布日期 2001.06.29
申请号 JP20000087083 申请日期 2000.03.23
申请人 HITACHI CHEM CO LTD 发明人 NATORI MICHIKO
分类号 G03F7/028;G03F7/004;G03F7/029;G03F7/033;G03F7/40;H05K3/28 主分类号 G03F7/028
代理机构 代理人
主权项
地址
您可能感兴趣的专利