| 摘要 |
PURPOSE: To provide a mask inspection device and mask inspection method capable of inspecting a mask with an electron beam exposure device and making the installation of an independent inspection device unnecessary. CONSTITUTION: In an electron beam exposure device 1 having an electron gun 11 for emitting election beams EB, an irradiating optical system 12 for irradiating electron beams emitted to the mask M, and an image forming optical system 16 for forming an image of the electron beams passed through the mask M on a wafer W, an electron detector 20 that can be mounted/demounted with a loafing mechanism 21 and detecting the electron beams passed through the mask M when mounted, and a computer 30 for inspecting the defects of the mask M based on the electron beans detected with the electron detector 20, are installed in the position directly below the mask M. Independent installation of the mask inspection device is made unnecessary, the facility space in the manufacturing plant of a semiconductor device is reduced, and the cost for the device as a whole for manufacturing the semiconductor device is also reduced. |
