| 摘要 |
PURPOSE: To provide a filter unit capable of reducing a load of itself and a following harmful effect removing device by removing over a long period of time the particulates including the impurity, other mist and dust such as reaction product in the waste gas discharged from a semiconductor manufacturing process, etc. CONSTITUTION: Gas impermeable partition walls 2-1, 2-2 and 2-3 are provided so that flow passages 5-1 and 5-2 in which the gas to be treated progresses in spiral at more than one revolutions in the filter unit are formed. Filter members 3-1, 3-2 and 3-3 are laminated on at least one side surface of the partition walls 2-1, 2-2 and 2-3 forming the flow passages 5-1 and 5-2 so that it does not clog the flow passages 5-1 and 5-2. Therefore, the load of the harmful effect removing device is reduced, the number of cleaning and device life are drastically improved, and also the harmful effect removing device itself may be eliminated depending on the kind of the exhaust gas by incorporating the filter unit at an exhaust gas life of semiconductor manufacturing process.
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