发明名称 DEFECT REPAIR METHOD OF THIN FILM PHOTOELECTRIC CONVERSION MODULE AND MANUFACTURING METHOD THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To provide a defect repair method of a thin film photoelectric conversion module where a shortcircuit part can be subjected to insulation treatment even if a cell has a tandem type structure, and a manufacturing method of the thin film photoelectric conversion module. SOLUTION: This defect repair method of a thin film photoelectric conversion module 1, which has a plurality of thin film photoelectric conversion cells 10 with a structure where a first electrode layer 3, a plurality of thin film photoelectric conversion units 4a, 4b and a second electrode layer 5 are laminated on a substrate 2 one by one respectively and whose thin film photoelectric conversion units 4a, 4b have different absorption wavelength ranges each and form a tandem type structure, comprises a process for insulating a shortcircuit part 9 formed in the thin film photoelectric conversion unit 4b of smaller photoelectromotive force by applying reverse bias voltage, while casting light so that photoelectromotive force of one of the plurality of thin film photoelectric conversion units 4a, 4b is smaller than that of the other thereof.</p>
申请公布号 JP2001168355(A) 申请公布日期 2001.06.22
申请号 JP19990346489 申请日期 1999.12.06
申请人 KANEGAFUCHI CHEM IND CO LTD 发明人 HAYASHI KATSUHIKO
分类号 H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L31/04
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