发明名称 COMPOSITION FOR FORMING INORGANIC FILM AND METHOD FOR FORMING INORGANIC FILM
摘要 PURPOSE: To obtain a composition which can form an inorganic film, such as a conductive film, an insulation film, a light-absorbing film, or a phosphor film, by a low-temperature baking process by compounding a photosensitive agent, a powder, and a nitrate and/or a metal salt of an organic acid. CONSTITUTION: Preferably, the composition comprises, based on the solid content, 4-24 wt.% photosensitive agent, 70-95 wt.% powder, and 0.1-20 wt.% nitrate or 0.1-20 wt.% metal salt of an organic acid. The joint use of a nitrate and a metal salt of an organic acid is preferable since the effect on accelerating low-temperature baking is further enhanced; in this case, the use of a nonmetal salt (e.g. ammonium nitrate) alone as the nitrate or the use of a mixture of a metal salt and a nonmetal salt is preferable. A known photosensitive agent can be used here. According to the kind of an inorganic film to be formed, a powder having properties, such as conductivity, insulation (dielectric) properties, light-absorbing properties, or fluorescent properties, is used.
申请公布号 KR20010049747(A) 申请公布日期 2001.06.15
申请号 KR20000039107 申请日期 2000.07.08
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 OBATA TAKEKAZU;SATO YOSHIMI;TAKANASHI HIROSHI
分类号 H01J9/227;C09D1/00;C09D5/00;G03F7/004;G03F7/40;H01L21/027 主分类号 H01J9/227
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