| 摘要 |
PURPOSE: A method for manufacturing a dielectric layer is provided to prevent an electrical characteristic from being deteriorated in a subsequent process after a dielectric layer is formed. CONSTITUTION: An upper electrode(23) is formed on the dielectric layer having an excessive quantity of oxygen. An interlayer dielectric(24) or passivation layer is selectively formed on the upper electrode. A heat treatment process is performed regarding the resultant structure having the interlayer dielectric or passivation layer to activate the oxygen excessively added in the dielectric layer.
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