| 摘要 |
PURPOSE: A liquid treatment apparatus and a method is provided to prevent a treating liquid from leaking out of the apparatus when a feed nozzle having a feed region is scanned to feed the treating liquid to the wafer. CONSTITUTION: A cup(3) is formed in which an upper part(31a) is of square cylindrical shape, a lower part(31b) is circular cylindrical and the circular cylindrical part is inside the square cylindrical part when the cup(3) is seen from above, the cup has a lifting mechanism, a controller(7) controls so that the upper part of the cap locates at the side of the wafer(W), when a feed nozzle(6) is scanned and the lower part of the cup locates at a position covering the upper level and lower level of the safer, when a cleaning liquid and a developing liquid are shook off. The scan of the feed nozzle(6) is made, while the nozzle is located in the upper part cap.
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