发明名称 |
METHOD FOR IMPROVING THE RATE OF A PLASMA ENHANCED VACUUM TREATMENT |
摘要 |
For increasing the rate with which a workpiece is treated in a plasma enhanced chemical vapor deposition method and thereby lowering for coating treatment exposure of the coating to ion impact, there is maintained a non-vanishing dust particle density along the surface to be treated with a predetermined density distribution along this surface. The density distribution may be controlled by appropriately applying a field of force substantially in parallelism to the surface to be treated and acting on the dust particles entrapped in the plasma discharge.
|
申请公布号 |
US2001003272(A1) |
申请公布日期 |
2001.06.14 |
申请号 |
US19990379742 |
申请日期 |
1999.08.24 |
申请人 |
UNAXIS BALZERS AKTIENGESELLSCHAFT |
发明人 |
SCHMITT JACQUES;MURALT PAUL-RENE |
分类号 |
C23C14/54;B65G49/07;C23C16/44;C23C16/50;C23C16/52;C23C16/54;C23F4/00;H01L21/205;H05H1/46;(IPC1-7):H01L21/306 |
主分类号 |
C23C14/54 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|