发明名称 METHOD OF MANUFACTURING THIN FILM BY YAG FIFTH HARMONIC PULSE LASER VAPOR DEPOSITION, AND ITS APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin film by a YAG fifth harmonic pulse laser vapor deposition, and its apparatus. SOLUTION: In the manufacturing method and its apparatus, crystalline and amorphous thin films of a target substance, a thin film of a device pattern, and its laminated thin film are manufactured by successively implementing by the predetermined pulse number a first step in which harmonics different in wavelength of the pulse laser such as Nd: YAG are coupled with each other, and only the fifth harmonic short in wavelength is separated, and a second step in which the separated fifth harmonic is converged and irradiated on a target by using a lens, the target substance is decomposed and evaporated in a pulse manner, and collided on a substrate as it is or through a mark for device pattern, and successively implementing the operation for a plurality of targets.
申请公布号 JP2001158957(A) 申请公布日期 2001.06.12
申请号 JP19990341661 申请日期 1999.12.01
申请人 NATL INST OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY METI 发明人 MUTO HACHIZO;KUSUMORI TAKESHI
分类号 H01L21/203;C23C14/28;(IPC1-7):C23C14/28 主分类号 H01L21/203
代理机构 代理人
主权项
地址