| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing apparatus and a method which can sufficiently lower a leakage magnetic field for the area near a processing apparatus and the position isolated for the constant distance therefrom, in the processing apparatus provided with a diopole ring magnet(DRM). SOLUTION: In a processing apparatus 1, in which a dipole ring magnet(DRM) 40 rotates around the outer circumference of a processing chamber provided with a plasma generating apparatus, a magnetic field is formed in a direction canceling leakage magnetic field generated at the outer side of the dipole ring magnet 40 by rotating, in a direction opposite to the rotating direction of the dipole ring magnet 40, an almost columnar shield plate 60 covering the external circumference of the dipole ring magnet 40 on the same axis as the dipole ring magnet 40 and thereby causes the leakage magnetic field generated at the external side of the dipole ring magnet 40 to be cancelled.
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