发明名称 Non-volatile ferroelectric storage cell comprises gate electrodes on an active region of a substrate, ferroelectric layers with electrodes and metallizations
摘要 Non-volatile ferroelectric storage cell comprises a number of first gate electrodes (123) and second gate electrodes (123a) electrically separated from each other on an active region of a substrate; a number of first electrodes (127) of first ferroelectric capacitors connected with the substrate on the side of the first gate electrode, and a number of first electrodes (127a) of second ferroelectric capacitors connected to the substrate on the side of the second gate electrode; ferroelectric layers (128, 128a) formed on the first electrodes; second electrodes (160) of the first ferroelectric capacitors and second electrodes of the second ferroelectric capacitors formed on the ferroelectric layers; and a first metallization (130) electrically connecting the first gate electrodes and a second metallization (130a) electrically connecting the second gate electrodes. An Independent claim is also included for a process for the production of a non-volatile ferroelectric storage cell. Preferred Features: A barrier metal layer made of TiN, RuO2, IrO2 and PtSi2 is formed below the first electrodes of the ferroelectric capacitors.
申请公布号 DE10054595(A1) 申请公布日期 2001.05.31
申请号 DE20001054595 申请日期 2000.11.03
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 KANG, HEE BOK
分类号 H01L27/105;G11C11/22;H01L21/02;H01L21/8246;H01L27/115;(IPC1-7):H01L27/105;H01L21/823 主分类号 H01L27/105
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