发明名称 |
Non-volatile ferroelectric storage cell comprises gate electrodes on an active region of a substrate, ferroelectric layers with electrodes and metallizations |
摘要 |
Non-volatile ferroelectric storage cell comprises a number of first gate electrodes (123) and second gate electrodes (123a) electrically separated from each other on an active region of a substrate; a number of first electrodes (127) of first ferroelectric capacitors connected with the substrate on the side of the first gate electrode, and a number of first electrodes (127a) of second ferroelectric capacitors connected to the substrate on the side of the second gate electrode; ferroelectric layers (128, 128a) formed on the first electrodes; second electrodes (160) of the first ferroelectric capacitors and second electrodes of the second ferroelectric capacitors formed on the ferroelectric layers; and a first metallization (130) electrically connecting the first gate electrodes and a second metallization (130a) electrically connecting the second gate electrodes. An Independent claim is also included for a process for the production of a non-volatile ferroelectric storage cell. Preferred Features: A barrier metal layer made of TiN, RuO2, IrO2 and PtSi2 is formed below the first electrodes of the ferroelectric capacitors.
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申请公布号 |
DE10054595(A1) |
申请公布日期 |
2001.05.31 |
申请号 |
DE20001054595 |
申请日期 |
2000.11.03 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
KANG, HEE BOK |
分类号 |
H01L27/105;G11C11/22;H01L21/02;H01L21/8246;H01L27/115;(IPC1-7):H01L27/105;H01L21/823 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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