发明名称 METHOD AND APPARATUS FOR PERSONALIZATION OF SEMICONDUCTOR
摘要 <p>A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.</p>
申请公布号 WO0139269(A1) 申请公布日期 2001.05.31
申请号 WO2000SE02325 申请日期 2000.11.24
申请人 MICRONIC LASER SYSTEMS AB;SANDSTROEM, TORBJOERN 发明人 SANDSTROEM, TORBJOERN
分类号 G03F1/08;G03F7/20;H01L21/027;H01L23/58;(IPC1-7):H01L23/544 主分类号 G03F1/08
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