| 摘要 |
PROBLEM TO BE SOLVED: To provide a phase shift mask and a phase shift mask blank capable of high precision patterning and high in acid resistance and reliability. SOLUTION: In the half tone type phase shift mask blank having a transparent substrate 10, a half tone material film 11 and a metallic film 12 laminated on the half tone material film, at least a material of the metallic film in contact with the half tone material film is made from a material containing nitrogen. |
