发明名称 IMPROVEMENTS IN OR RELATING TO EPITAXIAL FILM FORMATION
摘要 1,270,550. Semi-conductor device manufacture. WESTERN ELECTRIC CO. Inc. 22 Dec., 1969 [27 Dec., 1968], No. 62287/69. Heading H1K. [Also in Divisions C1 and C7] An epitaxial film of Group III(a) and V(a) elements (Mendelyeev Table given in the Handbook of Chemistry and Physics) is deposited on a substrate of e.g. Si, Ge, gallium arsenide, phosphide or arsenic phosphide, indium arsenide or phosphide or sapphire. Examples of the film are (1) gallium arsenide, (2) gallium phosphide, (3) Ga.As 0 . 25 P 0 . 75 , (4) gallium arsenide with Zn, 'and (5) Gallium arsenide with Te.
申请公布号 GB1270550(A) 申请公布日期 1972.04.12
申请号 GB19690062287 申请日期 1969.12.22
申请人 WESTERN ELECTRIC COMPANY, INCORPORATED 发明人 JOHN READ ARTHUR JR.
分类号 C30B23/08;C23C14/06;C23C14/24;C30B23/02;C30B29/40;H01L21/203 主分类号 C30B23/08
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