| 摘要 |
The invention relates to a method for producing a conductor structure on a dielectric material, in which method the dielectric material, in a first time period, is exposed to a bath of a first conductive material in order to cover those surfaces which will carry the conductor structure with a layer of the first conductive material, then, in a second time period, the dielectric material is exposed to a bath of a second conductive material, the layer of the first conductive material being substantially covered by a layer of the second conductive material, and, in a third time period, the dielectric material is exposed to a bath of a third conductive material, the layer of the second conductive material being substantially covered by a layer of the third conductive material. According to the invention, the three conductive materials are chosen such that the second conductive material has a process speed which is very much higher than the first material and the third material in the covering processes. |
