| 摘要 |
<p>A method of nitriding a iron group alloy base material, which can sufficiently remove a passive film, provide a positive and uniform nitriding, and shorten an overall nitriding time. A method of nitriding a iron group alloy base material (material to be treated) including alloy elements forming nitrides by a plasma-nitriding including a passive film removing process, the passive film removing being carried out by hydrogen sputtering under a reduced pressure, the hydrogen sputtering preferably being started at room temperature during heating process of a material to be treated for plasma sputtering.</p> |
