发明名称 SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
摘要 PURPOSE: To realize fine patterning and reduction of ON resistance in an MOSFET for high frequency amplification having a drain offset region. CONSTITUTION: Conductor plugs 13(P1) for leading out electrode are provided on a source region 10, a drain region 9 and a reach through layer 3(4). The conductor plugs 13(P1) are connected, respectively, with first layer interconnections 11s, 11d(M1) which are connected, on the conductor plugs 13(P1), with second layer interconnections 12s, 12d for lining.
申请公布号 KR20010039882(A) 申请公布日期 2001.05.15
申请号 KR20000053883 申请日期 2000.09.14
申请人 HITACHI, LTD. 发明人 HOSHINO YUTAKA;IKEDA SHUJI;KAMOHARA SHIRO;KAWAKAMI MEGUMI;MIYAKE TOMOYUKI;MORIKAWA MASATOSHI;YOSHIDA ISAO
分类号 H01L29/78;H01L21/336;H01L21/8234;H01L23/482;H01L23/532;H01L27/04;H01L27/088;H01L29/417;(IPC1-7):H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址