| 摘要 |
PURPOSE: Provided are an aligning method and an aligner that the dimension of a pattern formed on a substrate is uniformized in each projecting area at the time of transferring the image of the pattern formed on a mask through plural projection optical systems to the substrate. CONSTITUTION: The aligner(1) is provided with the plural projection optical systems(5) arranged so as to correspond to plural illuminating optical systems(4), a dimension measuring system(30) to measure the dimension of the pattern formed at the substrate W and a control system(7) individually changing at least one of the irradiating quantity of the aligning light of the optical system(4), the optical characteristic of the optical system(4) and the optical characteristic of the projection optical system(5) per the optical systems(4,5) respectively deciding the projection area based on the measured result of the dimension measuring system(30), so that the dimension of the pattern per each projection area is uniformized without being affected by the difference of the characteristic of the respective optical systems(4,5).
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