发明名称 |
Method of producing self-trimming sublithographic electrical wiring |
摘要 |
A method for forming an interconnect wiring structure, such as a fuse structure, comprises forming an opening in an insulating layer using a phase shift mask (the opening having vertical sidewalls sloped sidewalls and horizontal surfaces), depositing a conductive material in the opening and removing the conductive material from the sloped sidewalls and horizontal surfaces, wherein the conductive material remains on the vertical sidewalls as fuse links.
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申请公布号 |
US2001000917(A1) |
申请公布日期 |
2001.05.10 |
申请号 |
US20000734668 |
申请日期 |
2000.12.13 |
申请人 |
ARNDT KENNETH C.;HSU LOUIS L.;MANDELMAN JACK A.;MULLER K. PAUL |
发明人 |
ARNDT KENNETH C.;HSU LOUIS L.;MANDELMAN JACK A.;MULLER K. PAUL |
分类号 |
H01L23/525;(IPC1-7):H01L27/10;H01L21/44 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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