APPARATUS FOR IRRADIATING ULTRAVIOLET RAYS

摘要

PURPOSE: An apparatus for irradiating ultraviolet rays is provided to remove pollutant from a surface of a wafer or a glass substrate. CONSTITUTION: An apparatus for irradiating ultraviolet rays comprises a vacuum chamber(103), an ultraviolet ray source(107), a support portion(109), and a control portion. The vacuum chamber(103) is formed with a gas supply portion(103a) and a vacuum exhaust portion(103b). The ultraviolet ray source(107) is formed on an upper side of the vacuum chamber(103) in order to irradiate ultraviolet rays to a surface of an object. The support portion(109) supports the object. The ultraviolet rays are irradiated from the ultraviolet ray source(107) to the object under the low vacuum of 360 to 361 milli torr.