Photosensitive resin composition and method for forming pattern using the same,申请号EP19960300399-传众专利搜索

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发明名称	Photosensitive resin composition and method for forming pattern using the same
摘要
申请公布号	EP0725315(B1)	申请公布日期	2001.05.02
申请号	EP19960300399	申请日期	1996.01.22
申请人	NIPPON PAINT CO., LTD.	发明人	TSUSHIMA, HIROSHI;MIKAMI, SHIGERU;WATANABE, EMI;IMAMURA, TSUYOSHI;SUMIYOSHI, IWAO
分类号	G03F7/075;(IPC1-7):G03F7/075;G03C7/12	主分类号	G03F7/075
代理机构		代理人
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