发明名称 |
Apparatus for automated pillar layout |
摘要 |
Disclosed is an apparatus for generating mask data suitable to produce a support pillar mask used in air dielectric interconnect structures. The apparatus includes a mask data scanner configured to select features having an interconnect dimension from a first mask. The features having the interconnect dimension being defined to electrically interconnect devices distributed on a substrate. The apparatus further includes a mask data comparing engine for comparing mask data associated with an intermediate support pattern and mask data associated with the features having the interconnect dimension selected by the mask data scanner. The comparing being configured to identify a mask area where the intermediate support pattern and the features having the interconnect dimension overlap. Preferably, the identified mask area defines the location of a plurality of pillars.
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申请公布号 |
US6226782(B1) |
申请公布日期 |
2001.05.01 |
申请号 |
US19990304886 |
申请日期 |
1999.05.04 |
申请人 |
PHILIPS ELECTRONICS NORTH AMERICA CORP. |
发明人 |
NOWAK EDWARD D.;BOTHRA SUBHAS |
分类号 |
H01L23/528;(IPC1-7):G06F17/00 |
主分类号 |
H01L23/528 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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