发明名称 |
Three-dimensional microstructures, and methods for making three-dimensional microstructures |
摘要 |
Methods are disclosed for making microstructures. In one method, the resist layer is reversibly deformed during exposure. When the resist is flattened and developed after exposure, non-vertical features result that are not obtainable through other existing means. One application of this method is to make nested cones suitable for use as a highly efficient x-ray lens. In another disclosed method, "halftone" lithography is used to generate microstructures having features whose height may vary continuously. One application of this method is to make a novel telescope array, a thin film having telescopic magnification properties.
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申请公布号 |
US6226120(B1) |
申请公布日期 |
2001.05.01 |
申请号 |
US19940347804 |
申请日期 |
1994.11.30 |
申请人 |
BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE |
发明人 |
FELDMAN MARTIN |
分类号 |
G02B3/00;G02B23/00;(IPC1-7):G02B23/00;G02B27/10;G02C1/00 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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