DEVICE AND METHOD FOR PATTERN INSPECTION

摘要

PROBLEM TO BE SOLVED: To provide a pattern inspection device which can perform stable detecting operation by reducing the influence of noise when detecting a defect that a repetitive pattern has without giving an ideal pattern in advance. SOLUTION: The pattern inspection device 1 is equipped with an ideal pattern generation part 30 which automatically generates an ideal pattern PR and a comparison decision part 50 which decides a defect of an inspected pattern by using the result of a comparison between the ideal pattern PR and inspected pattern PS. The ideal pattern generation part 30 extracts and compares *>3 reference unit patterns Pi included in an inspected image S and selecting as the gradation value of the ideal pattern PR a gradation value regarding one of reference unit patterns Pi for every corresponding pixel according to specific reference, e.g. the selection of the 2nd gradation value from the smallest value to generate the ideal pattern PR.