发明名称 |
Method of making highly defined bilayer lift-off mask |
摘要 |
A method makes a highly defined bilayer lift-off mask wherein lift-off mask material is subjected to an electron beam for decreasing the molecular weight of a bottom release layer and increasing the molecular weight of a top photoresist layer so that a weak developer can be employed for patterning the bottom release layer and ion milling, which is employed for removing layers not covered by the lift-off mask, does not alter a track width of the top photoresist layer.
|
申请公布号 |
US6218056(B1) |
申请公布日期 |
2001.04.17 |
申请号 |
US19990281248 |
申请日期 |
1999.03.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
PINARBASI MUSTAFA;RENALDO ALFRED FLOYD |
分类号 |
G03F7/095;G03F7/20;G11B5/31;G11B5/39;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/095 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|