发明名称 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE: To provide a semiconductor storage device, which can be integrated in a semiconductor storage device, comprising a semiconductor memory cell to which a source is in common connected, and its manufacture. CONSTITUTION: In a semiconductor storage device, having an element isolation film formed in a silicon substrate 101 and a plurality of semiconductor memory cells formed between the element isolation films, there are provided conductive films 116a, 116b which are formed on the plane of the silicon substrate 101, and connect a source diffusion region 112 of at least two semiconductor memory cells.
申请公布号 KR20010030022(A) 申请公布日期 2001.04.16
申请号 KR20000043494 申请日期 2000.07.27
申请人 FUJITSU LIMITED 发明人 HASHIMOTO HIROSHI
分类号 H01L27/10;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/10 主分类号 H01L27/10
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