| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate support mechanism which can prevent incomplete treatment of substrates by reducing the residues in a treating liquid. SOLUTION: A substrate support mechanism 10 which is used in a substrate processor of a structure for processing a substrates 9 with a treating liquid has a constitution, wherein a multitude of support grooves having such a form that the sides of apertures formed in the upper ends of the grooves are formed wide and the sides of the base ends, which are separated from the above apertures, of the grooves are formed narrow in a side surface view are formed at a constant pitch in their longitudinal directions, and one pair of substrate support means 1a and 1b are arranged in such a way that they are shifted by 1/2 of the pitch between the support grooves in their longitudinal directions.</p> |
