| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-cleaning particle detecting device and a method of using the same by which time between cleaning of a substrate, such as a semiconductor wafer and detection of particles as well as waste of labor is eliminated, and efficiency and yield in manufacture of a substrate can be improved. SOLUTION: This substrate-cleaning particle detecting device is provided with a cleaning water spraying nozzle 12 for cleaning a rotating wafer 10 by spraying a cleaning solution W and a HeNe laser oscillating tube 14 and optical detector 16, which constitute a detecting means for detecting particles of this semiconductor wafer 10, while rotating the semiconductor wafer 10.
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