发明名称 |
Fabrication process for a three- dimensional suspended microstructure, an integrated microstructure obtained by this process and an adjustable integrated micro-optical element |
摘要 |
<p>The invention concerns a method for making a suspended microstructure comprising the following steps: forming a masking layer on a substrate top surface; structuring the masking layer to form at least an opening substantially defining the surface of said microstructure and for exposing part of the substrate corresponding to said surface; causing by electrochemical process said exposed semiconductor material to become porous over a predetermined thickness; electropolishing the semiconductor material underlying said microstructure made porous to form a cavity enclosing at least partially said microstructure beneath the masking layer level; and releasing said microstructure made porous to form a microstructure suspended to said substrate by at least a connection portion of its perimeter to provide said microstructure with mobility outside the substrate plane.</p> |
申请公布号 |
EP1088785(A1) |
申请公布日期 |
2001.04.04 |
申请号 |
EP19990117852 |
申请日期 |
1999.09.10 |
申请人 |
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE |
发明人 |
GERHARD, LAMMEL |
分类号 |
B81B3/00;B81C1/00;G02B7/00;G02B26/00;G02B26/08;H01L21/306;H01L31/0216;(IPC1-7):B81B3/00 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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