发明名称 |
PHOTOINDUCED ACID GENERATOR AND RADIATION-SENSITIVE COMPOSITION CONTAINING SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition excellent in storage stability of sensitivity by specifying the ratio of the difference in electrical conductivity between the extraction water layer of a solution prepared by dissolving a photoinduced acid generator generating an acid when irradiated with a radiation in an organic solvent and the extraction water layer of the solvent to the concentration of the solution to a certain value or lower. SOLUTION: This radiation-sensitive composition comprises 100 pts.wt. coating-film-forming resin which becomes alkali-soluble in the presence of an acid, such as polyvinylphenol, 0.1-20 pts.wt. photoinduced acid generator which generates an acid when irradiated with a radiation and a basic compound such as an amine in an amount of 0.1-50 mol% or an amide in an amount of 0.1-500 mol% based on the photoinduced acid generator. An example of the acid generator is a bissulfonyldiazomethane derivative. The ratio of the difference (κ1-κ2)=κ between the electrial conductivity κ1 (μs/cm) of a water layer formed by extracting a solution prepared by dissolving the photoinduced acid generator in an organic solvent with 0.7 volume times as much water and the electrical conductivity κ2 of a water layer formed by extracting the organic solvent containing no photoinduced acid generator with 0.7 volume times as much water to the concentration X (mmol/l) of the solution satisfies the relation represented by the formula: κ/X<=0.18. |
申请公布号 |
JP2001081441(A) |
申请公布日期 |
2001.03.27 |
申请号 |
JP19990248150 |
申请日期 |
1999.09.02 |
申请人 |
SHIPLEY CO LLC |
发明人 |
NAKANO KOJI;TAKADA YOSHIHIRO;OHATA TATSUHIRO |
分类号 |
H01L21/027;C09K3/00;G03F7/004 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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