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发明名称
PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS
摘要
申请公布号
KR20010023941(A)
申请公布日期
2001.03.26
申请号
KR1020007002643
申请日期
2000.03.13
申请人
发明人
分类号
C08G61/08
主分类号
C08G61/08
代理机构
代理人
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