WAFER DRYING DEVICE, METHOD AND IPA MIST SPRAY DEVICE FOR WAFER DRYING DEVICE

摘要

PROBLEM TO BE SOLVED: To eliminate the need to provide a nitrogen gas feeding passage and a liquid-phase IPA(Isopropyl Alcohol) feeding passage in an IPA mist spray device for a wafer drying device, and to contrive to make it possible to stabilize the mixing ratio of IPA with nitrogen gas in each jet part in the spray device. SOLUTION: This spray device is provided with an IPA mist forming part 34 which forms the IPA mist by making nitrogen gas mixture with liquid-phase IPA, and an IPA mist spray part 37 which has IPA mist jet nozzles on an IPA mist jet side and makes the mist formed in the forming part 34 jet toward a wafer through the jet nozzles.