PRODUCTION OF THREE DIMENSIONAL PHOTONIC CRYSTAL STRUCTURE

摘要

PROBLEM TO BE SOLVED: To obtain a structural body in which a three-dimensional full-band gap can be formed by a vertical hole process method by alternately laminating layers on a substrate having a pattern formed on which a shape-holding multilayer can be easily formed by self cloning. SOLUTION: A medium 30 (SiO2) and a medium 29 (a-Si) are alternately laminated by bias sputtering on a substrate having a pattern formed. By using a laminating mode to completely keep the form of the base (self cloning mode), a two-dimensional periodical laminated structure can be produced. Then, a two-dimensional periodical hole resist pattern is formed again by a lithographic process in this structural body. By using the resist pattern and by vertical dry etching, vertical holes 32 are formed in the structure. As a result, a three- dimensional photonic crystal structural body 34 having the high refractive index medium 29, high refractive index medium 30 and low refractive index medium 33 can be produced.