| 摘要 |
A method for the production of a magnetic head, where first a lower magnetic pole is formed on a wafer. Next, a nonmagnetic write gap layer is formed on the lower magnetic pole. A coil is then formed to be sandwiched between nonmagnetic insulating layers on the nonmagnetic write gap layer. Finally, an upper magnetic pole, provided with a pole tip, is formed to contact the write gap layer on the nonmagnetic write gap layer. After formation, a focused ion beam is irradiated in the direction from a thickness of the pole tip to the lateral parts of the pole tip, the nonmagnetic write gap layer lying directly thereunder. The lower magnetic pole thereby trims the lateral parts of the pole tip while consequently decreasing the width of the pole tip. At the same time, depressed parts are formed in the lower magnetic pole in the areas extending outward from directly below the lateral parts of the pole tip. The width of the pole tip is then equalized and a width of the lower magnetic pole is sandwiched by the depressed parts. Lastly, a protective layer is formed, which is made of a nonmagnetic insulating material, fills in the depressed parts, and, at the same time, covers the upper magnetic pole and the lower magnetic pole.
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